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Session 3: Analytical methods

 

Lecture 20

Resonant Soft X-ray Scattering Studies
for Magnetic Thin Films

Ki Bong Lee

Department of Physics, Pohang University of Science and Technology,
Pohang, Gyeongbuk, 790-784 Republic of Korea

 

 

 Resonant x-ray scattering has been a powerful probe to characterize properties of new emergent materials. Sincemany of their interesting properties are originated from couplings between their charge, orbital and spin degrees offreedom, a diagnostic tool sensitive to all of them would be very desirable to understand the phenomena exhibited inthose materials. Resonant x-ray scattering using hard x-rays from synchrotron has been very effective to investigatemagnetic, orbital ordering of rare-earth metal compounds since mid-1980's.1-2) However, experiments using hardx-rays have limitations for measurements of ordering in 3d transition metal compounds since their energies do notmatch with those of L-edges for 3d elements. Recent developments in soft x-ray scattering instrumentation allow us toinvestigate ordering in 3d electrons by observing transition from 2p states directly. Soft x-rays have long wavelengthsand short penetration lengths, which could be serious limitations for single crystal studies. But they match very wellwith dimensions of magnetic thin films. Resonant soft x-ray scattering has been successfully utilized in analysis of thinfilms such as layer-by layer hysteresis loop of a magnetic superlattice,3) modified electronic structure near interfacesin a (LaTiO3/SrTiO3) superlattice and etc. In this talk, advantages and limitations of resonant soft x-ray scattering areaddressed while some results of resonant soft x-ray scattering experiments are presented.

References

1. D. Gibbs, G. Grubel, D. R. Harshman, E. D. Isaacs, D. B. McWhan, D. Mills, and C. Vettier, Phys Rev. Lett.. 61, 1241 (1988).
2. S. Ji, C. Song, J. Koo, J. Park, Y. J. Park, K.-B. Lee, Seongsu Lee, J.-G. Park, J. Y. Kim, B. K. Cho, K.-P. Hong, C.-H. Lee, and F. Iga, Phys. Rev. Lett., 99, 076401 (2007).
3, J. Park, D. R. Lee, Y. Choi, J. F. Freeland, K.-B. Lee, S. K. Sinha, K. R. Nikolaev, and A. M. Allen, Appl. Rev. Lett., 95, 102504 (2009).